Title:
MAGNETIC THIN FILM
Document Type and Number:
WIPO Patent Application WO/2008/026439
Kind Code:
A1
Abstract:
Disclosed are a magnetic thin film, a sputtering target and a vapor deposition material, each composed of 40-60 at% of Pt, 40-60 at% of Fe, 0.05-1.0 at% of P, and additionally if necessary, 0.4-19.5 at% of Cu and/or Ni.
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Inventors:
HASEGAWA, Koichi (Ltd. Soka 1st Plant 12-30, Aoyagi 2-chome, Soka-sh, Saitama 02, 3400002, JP)
Application Number:
JP2007/065674
Publication Date:
March 06, 2008
Filing Date:
August 03, 2007
Export Citation:
Assignee:
ISHIFUKU METAL INDUSTRY CO., LTD. (20-7, Uchikanda 3-chome Chiyoda-k, Tokyo 54, 1018654, JP)
石福金属興業株式会社 (〒54 東京都千代田区内神田三丁目２０番７号 Tokyo, 1018654, JP)
石福金属興業株式会社 (〒54 東京都千代田区内神田三丁目２０番７号 Tokyo, 1018654, JP)
International Classes:
H01F10/14; C23C14/14; C23C14/24; C23C14/34; G11B5/64; H01F41/18; H01F41/20
Attorney, Agent or Firm:
ODAJIMA, Heikichi et al. (Odajima Patent Office, Nippon Jitensha Bldg. 9-15, Akasaka 1-chome, Minato-k, Tokyo 52, 1070052, JP)
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