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Title:
MAGNETORESISTIVE ELEMENT MANUFACTURING METHOD, AND MULTI-CHAMBER APPARATUS FOR MANUFACTURING THE MAGNETORESISTIVE ELEMENT
Document Type and Number:
WIPO Patent Application WO/2008/032745
Kind Code:
A1
Abstract:
A method for manufacturing a magnetoresistive element comprises a first step of preparing a magnetoresistive element having a magnetic film and a substrate, a second step of etching a predetermined zone of the magnetic film by a reactive ion etching method, and a third step of exposing the magnetic film after the second step, to a plasma of an ion current density of 4 x 10-7 A/cm2 or less.

Inventors:
IKEMOTO MANABU (JP)
OSADA TOMOAKI (JP)
YOKOKAWA NAOAKI (JP)
Application Number:
PCT/JP2007/067754
Publication Date:
March 20, 2008
Filing Date:
September 12, 2007
Export Citation:
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Assignee:
CANON ANELVA CORP (JP)
IKEMOTO MANABU (JP)
OSADA TOMOAKI (JP)
YOKOKAWA NAOAKI (JP)
International Classes:
H01L43/12; H01L21/02; H01L21/3065; H01L43/08
Domestic Patent References:
WO2007032379A12007-03-22
Foreign References:
JP2005277249A2005-10-06
JP2005042143A2005-02-17
JP2006049706A2006-02-16
JP2002167661A2002-06-11
JP2005044848A2005-02-17
JP2004235223A2004-08-19
JP2006156995A2006-06-15
JP2003203313A2003-07-18
JP2004326831A2004-11-18
JP2005042143A2005-02-17
JP2000345349A2000-12-12
JP2002083806A2002-03-22
JP2002212732A2002-07-31
JP2002212736A2002-07-31
JP2002246386A2002-08-30
JP2003197620A2003-07-11
JP2004111506A2004-04-08
JP2004296638A2004-10-21
JP2005268396A2005-09-29
JP2006049544A2006-02-16
JP2006248518A2006-09-21
Other References:
See also references of EP 2073286A4
Attorney, Agent or Firm:
OHTSUKA, Yasunori (SHUWA KIOICHO PARK BLDG. 3-6, KIOICHO, CHIYODA-K, Tokyo 94, JP)
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