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Title:
MAGNETORESISTIVE ELEMENT, AND PRODUCTION METHOD FOR MAGNETORESISTIVE ELEMENT
Document Type and Number:
WIPO Patent Application WO/2018/139249
Kind Code:
A1
Abstract:
The purposes of the present invention are to effectively achieve protection by way of a cap layer, reduce adverse effects caused by the cap layer, and achieve desired magnetoresistance characteristics, when forming a magnetoresistance effect film. This production method includes: a first step (fig. 4 (column b) and (column c)) for processing, into a prescribed shape, a layered film including a magnetoresistance effect film 4 having a resistance which changes in accordance with the magnetic field, and a cap layer 40 which is disposed above the magnetoresistance effect film, and which has a thickness in the range of 10-60 nm; a second step (fig. 4 (d)) in which the layered film is coated with an insulating film 61 to be protected thereby; a third step (fig. 4 (column e)) in which reactive etching is used to form openings in the insulating film, to expose the surface of the cap layer in the openings; a fourth step (fig. 4 (column f)) in which the surface of the cap layer exposed in the openings as a result of the third step is subjected to ion milling, and the cap layer is etched by an amount less than the total thickness of the cap layer; and a fifth step (fig. 4 (column g)) in which an upper layer (51) forming a part of a component is formed so as to be in contact with the surface of the cap layer remaining after the fourth step.

Inventors:
ANDO YASUO (JP)
OOGANE MIKIHIKO (JP)
FUJIWARA KOSUKE (JP)
JONO JUNICHI (JP)
SEKINE KOUJIROU (JP)
TSUCHIDA MASAAKI (JP)
Application Number:
PCT/JP2018/000917
Publication Date:
August 02, 2018
Filing Date:
January 16, 2018
Export Citation:
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Assignee:
UNIV TOHOKU (JP)
KONICA MINOLTA INC (JP)
International Classes:
G11B5/39; H01L43/08; H01L43/10; H01L43/12
Domestic Patent References:
WO2007105459A12007-09-20
WO2000077777A12000-12-21
Foreign References:
JP2004206822A2004-07-22
JP2016189375A2016-11-04
JP2006261259A2006-09-28
Attorney, Agent or Firm:
KOYO INTERNATIONAL PATENT FIRM (JP)
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