Title:
MAGNETRON SPUTTERING SCANNING METHOD FOR SURFACE MODIFICATION AND SURFACE SHAPE IMPROVEMENT OF SILICON CARBIDE OPTICAL MIRROR
Document Type and Number:
WIPO Patent Application WO/2019/153462
Kind Code:
A1
Abstract:
A magnetron sputtering scanning method for surface modification and surface shape improvement of a silicon carbide optical mirror: (1) for a silicon carbide plane mirror to be modified, firstly using a conventional polishing method or a CCOS numerical control machining method, and using diamond micro-powder to grind and roughly polish an aspheric silicon carbide mirror; (2) after the surface shape precision of the silicon carbide mirror complies with the modification requirements, depositing a dense Si modifying layer on the surface of the silicon carbide mirror by using an elongated magnetron sputtering source; (3) then using a circular sputtering source to correct and improve the surface shape of the mirror; and (4) finally performing fine polishing on the modifying layer so as to satisfy the requirements for the surface shape and roughness processing of the mirror. The method solves the problem of rework caused by the unsuitable thickness of the modifying layer in the silicon carbide mirror surface processing, and the process is simple and the processing efficiency and quality are significantly improved.
Inventors:
WANG JINFENG (CN)
HUANG MENG (CN)
TIAN JIE (CN)
WANG YERU (CN)
HUANG MENG (CN)
TIAN JIE (CN)
WANG YERU (CN)
Application Number:
PCT/CN2018/081213
Publication Date:
August 15, 2019
Filing Date:
March 30, 2018
Export Citation:
Assignee:
NANJING INSTITUTE OF ASTRONOMICAL OPTICS & TECH NATIONAL ASTORNOMICAL OBSERVATORIES CHINESE ACADEMY (CN)
International Classes:
C23C14/02; C23C14/35; C23C14/18; C23C14/58
Foreign References:
| CN101315435A | 2008-12-03 | |||
| CN101177779A | 2008-05-14 | |||
| US20090068503A1 | 2009-03-12 | |||
| US20120264020A1 | 2012-10-18 |
Attorney, Agent or Firm:
NANJING SUGAO PATENT AND TRADEMARK FIRM (ORDINARY PARTNERSHIP) (CN)
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