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Patent Searching and Data


Title:
MAKEUP APPLICATOR
Document Type and Number:
WIPO Patent Application WO/2011/024578
Kind Code:
A1
Abstract:
When using a makeup applicator, a cosmetic material has been excessively absorbed into the makeup applicator, sound due to void has occurred during the use of the makeup applicator, or wrinkles have occurred by the use thereof. In order to solve this, provided is a makeup applicator wherein one surface of a slice sheet (1) obtained by slicing an open-cell foam sponge forms a coating surface, and a coating layer (2) is provided so as to adhere to a recessed section, in accordance with the shape of the inner surface thereof, in which two types of recessed sections: a recessed section formed by that the surface of the other surface of the slice sheet (1) is roughened by a slice blade, and a recessed section formed by that the original foams of the open-cell foam sponge are cut are combined and formed, and wherein the surface on the side on which the coating layer (2) of the slice sheet (1) is formed is bonded to a base material (3).

Inventors:
NAKAMURA Kenji (3-41 Nishiawaji 6-chome, Higashi Yodogawa-ku, Osaka-sh, Osaka 31, 〒5330031, JP)
中村 憲司 (〒31 大阪府大阪市東淀川区西淡路6丁目3番41号 株式会社タイキ淡路工場内 Osaka, 〒5330031, JP)
Application Number:
JP2010/062143
Publication Date:
March 03, 2011
Filing Date:
July 20, 2010
Export Citation:
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Assignee:
NAKAMURA Kenji (3-41 Nishiawaji 6-chome, Higashi Yodogawa-ku, Osaka-sh, Osaka 31, 〒5330031, JP)
中村 憲司 (〒31 大阪府大阪市東淀川区西淡路6丁目3番41号 株式会社タイキ淡路工場内 Osaka, 〒5330031, JP)
International Classes:
A45D34/04
Attorney, Agent or Firm:
HASEBE Zentaro et al. (Enju-Ochanomizu Bldg. 3F, 17-2 Sotokanda 2-chome, Chiyoda-k, Tokyo 21, 〒1010021, JP)
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