Title:
MANUFACTURING DEVICE FOR NANOIMPRINT MOLD AND MANUFACTURING METHOD FOR NANOIMPRINT MOLD
Document Type and Number:
WIPO Patent Application WO/2012/014774
Kind Code:
A1
Abstract:
Disclosed is a manufacturing device for a nanoimprint mold, wherein said device anodises an aluminium substrate with electrolytic solution, and which is characterised in that at least the material on the surface of a portion which comes into contact with the electrolytic solution is a metal or an alloy thereof having an elution amount of not more than 0.2ppm/cm2 per unit surface of metal when immersed for 450 hours at room temperature in 80mL of electrolytic solution. Also disclosed is a manufacturing method for a nanoimprint mold, said method using the manufacturing device for a nanoimprint mold and carrying out anodising. The disclosed manufacturing method for a nanoimprint mold and disclosed manufacturing device for a nanoimprint mold enable the elution of metal to an electrolytic solution when anodising is carried out to be suppressed.
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Inventors:
OZAWA Satoru (Mitsubishi Rayon Co. Ltd., 20-1, Miyuki-cho, Otake-sh, Hiroshima 93, 〒7390693, JP)
小澤 覚 (〒93 広島県大竹市御幸町２０番１号 三菱レイヨン株式会社中央技術研究所内 Hiroshima, 〒7390693, JP)
KAMATA Masatoshi (Mitsubishi Rayon Co. Ltd., 20-1, Miyuki-cho, Otake-sh, Hiroshima 93, 〒7390693, JP)
鎌田 正俊 (〒93 広島県大竹市御幸町２０番１号 三菱レイヨン株式会社生産技術研究所内 Hiroshima, 〒7390693, JP)
小澤 覚 (〒93 広島県大竹市御幸町２０番１号 三菱レイヨン株式会社中央技術研究所内 Hiroshima, 〒7390693, JP)
KAMATA Masatoshi (Mitsubishi Rayon Co. Ltd., 20-1, Miyuki-cho, Otake-sh, Hiroshima 93, 〒7390693, JP)
鎌田 正俊 (〒93 広島県大竹市御幸町２０番１号 三菱レイヨン株式会社生産技術研究所内 Hiroshima, 〒7390693, JP)
Application Number:
JP2011/066554
Publication Date:
February 02, 2012
Filing Date:
July 21, 2011
Export Citation:
Assignee:
Mitsubishi Rayon Co., Ltd. (6-41, Konan 1-chome Minato-k, Tokyo 06, 〒1088506, JP)
三菱レイヨン株式会社 (〒06 東京都港区港南一丁目６番４１号 Tokyo, 〒1088506, JP)
OZAWA Satoru (Mitsubishi Rayon Co. Ltd., 20-1, Miyuki-cho, Otake-sh, Hiroshima 93, 〒7390693, JP)
小澤 覚 (〒93 広島県大竹市御幸町２０番１号 三菱レイヨン株式会社中央技術研究所内 Hiroshima, 〒7390693, JP)
KAMATA Masatoshi (Mitsubishi Rayon Co. Ltd., 20-1, Miyuki-cho, Otake-sh, Hiroshima 93, 〒7390693, JP)
三菱レイヨン株式会社 (〒06 東京都港区港南一丁目６番４１号 Tokyo, 〒1088506, JP)
OZAWA Satoru (Mitsubishi Rayon Co. Ltd., 20-1, Miyuki-cho, Otake-sh, Hiroshima 93, 〒7390693, JP)
小澤 覚 (〒93 広島県大竹市御幸町２０番１号 三菱レイヨン株式会社中央技術研究所内 Hiroshima, 〒7390693, JP)
KAMATA Masatoshi (Mitsubishi Rayon Co. Ltd., 20-1, Miyuki-cho, Otake-sh, Hiroshima 93, 〒7390693, JP)
International Classes:
C25D17/00; B29C33/38; B29C59/02; C25D11/10; C25D17/02; G02B1/11
Attorney, Agent or Firm:
SHIGA Masatake et al. (1-9-2, Marunouchi Chiyoda-k, Tokyo 20, 〒1006620, JP)
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