Title:
MANUFACTURING METHOD OF COLOR FILTER ARRAY SUBSTRATE AND COLOR FILTER ARRAY SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2021/007976
Kind Code:
A1
Abstract:
A manufacturing method of a color filter array substrate and a color filter array substrate. The manufacturing method comprises: sequentially forming, on a substrate (11), a thin film transistor array structure layer (12), a protection layer (13), a color resist layer (14) and a planarization layer (15); forming an opening structure (16) on the planarization layer (15), the color resist layer (14) and the protection layer (13), the opening structure (16) simultaneously extending through the planarization layer (15), the color resist layer (14) and the protection layer (13) to expose a source/drain metal layer (124); and forming a transparent electrically-conductive layer (17) on the planarization layer (15), the transparent electrically-conductive layer (17) covering the opening structure (16) and electrically connected to the source/drain metal layer (124).
Inventors:
YU CHENGZHONG (CN)
Application Number:
PCT/CN2019/112229
Publication Date:
January 21, 2021
Filing Date:
October 21, 2019
Export Citation:
Assignee:
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD (CN)
International Classes:
G02F1/1362
Foreign References:
| CN104656333A | 2015-05-27 | |||
| CN108873519A | 2018-11-23 | |||
| US20170315394A1 | 2017-11-02 | |||
| CN103325732A | 2013-09-25 | |||
| CN105353567A | 2016-02-24 | |||
| US20090115947A1 | 2009-05-07 |
Attorney, Agent or Firm:
ESSEN PATENT&TRADEMARK AGENCY (CN)
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