MANUFACTURING METHOD FOR ELASTIC WAVE DEVICE

WIPO Patent Application WO/2012/014791

A1

Disclosed is a method for manufacturing an elastic wave device, said method enabling the manufacture of an elastic wave device having excellent properties and provided with an IDT electrode of which at least part is positioned in a groove which has been formed on a piezoelectric substrate. Arrange a mask (21) for groove formation on a piezoelectric substrate (10). Use the mask (21) for groove formation to form a groove (10a) on the piezoelectric substrate (10). Remove the mask (21) for groove formation. Arrange a mask (22) for electrode formation on the piezoelectric substrate (10) from which the mask (21) for groove formation has been removed. Use the mask (22) for electrode formation to form an IDT electrode (11).

SAJI, Mari (10-1, Higashikotari 1-chome, Nagaokakyo-sh, Kyoto 55, 〒6178555, JP)
佐治　真理 (〒55 京都府長岡京市東神足１丁目１０番１号　株式会社村田製作所内 Kyoto, 〒6178555, JP)
TANIGUCHI, Norio (10-1, Higashikotari 1-chome, Nagaokakyo-sh, Kyoto 55, 〒6178555, JP)

JP2011/066651

February 02, 2012

July 22, 2011

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MURATA MANUFACTURING CO., LTD. (10-1, Higashikotari 1-chome Nagaokakyo-sh, Kyoto 55, 〒6178555, JP)
株式会社村田製作所 (〒55 京都府長岡京市東神足１丁目１０番１号 Kyoto, 〒6178555, JP)
SAJI, Mari (10-1, Higashikotari 1-chome, Nagaokakyo-sh, Kyoto 55, 〒6178555, JP)
佐治　真理 (〒55 京都府長岡京市東神足１丁目１０番１号　株式会社村田製作所内 Kyoto, 〒6178555, JP)

H03H3/08; H01L41/09; H01L41/18; H01L41/22; H03H9/145

MIYAZAKI & METSUGI (Chuo Odori FN Bldg, 3-8 Tokiwamachi 1-chome, Chuo-ku, Osaka-sh, Osaka 28, 〒5400028, JP)

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