MANUFACTURING METHOD OF MAGNETIC RECORDING MEDIUM

WIPO Patent Application WO/2011/125990

A1

Disclosed is a manufacturing method of a magnetic recording medium which allows removing unevenness in lamella thickness distribution of a lubricant film formed upon a surface of a protective layer and dramatically enhancing coverage of the lubricant film for the protective layer. The disclosed manufacturing method of the magnetic recording medium forms at least a magnetic layer (34) upon a non-magnetic substrate (31), then introduces a feedstock of gas including carbon into an evacuated deposition chamber, ionizes the gas by way of plasma, and forms a protective layer (35) comprising a carbon film upon the surface of the non-magnetic substrate (31) using the ions; wherein the disclosed manufacturing method of the magnetic recording medium includes a step of forming the protective layer (35), and then washing the magnetic recording medium using a wash liquid including hydrogen water.

JP3697963	POLISHING CLOTH AND SURFACE POLISHING WORK METHOD
JP2000348331	SUBSTRATE FOR MAGNETIC RECORDING MEDIUM, ITS SURFACE CONTROL METHOD AND MAGNETIC RECORDING MEDIUM
JP59068820	MAGNETIC RECORDING MEDIUM

SAKAGUCHI Ryuji (5-1 Yawata Kaigan dori, Ichihara-sh, Chiba 67, 〒2900067, JP)
坂口　竜二 (〒67 千葉県市原市八幡海岸通５番の１　昭和電工エレクトロニクス株式会社内 Chiba, 〒2900067, JP)

JP2011/058565

October 13, 2011

April 05, 2011

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SHOWA DENKO K.K. (13-9, Shibadaimon 1-chome Minato-k, Tokyo 18, 〒1058518, JP)
昭和電工株式会社 (〒18 東京都港区芝大門一丁目１３番９号 Tokyo, 〒1058518, JP)
SAKAGUCHI Ryuji (5-1 Yawata Kaigan dori, Ichihara-sh, Chiba 67, 〒2900067, JP)

G11B5/84

SHIGA Masatake et al. (1-9-2, Marunouchi Chiyoda-k, Tokyo 20, 〒1006620, JP)

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