Title:
MANUFACTURING METHOD OF TFT ARRAY SUBSTRATE AND TFT ARRAY SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2019/200834
Kind Code:
A1
Abstract:
The present invention provides a manufacturing method of a TFT array substrate and a TFT array substrate. The manufacturing method of the TFT array substrate comprises: depositing an electrode material layer and a metal material layer on a grid electrode insulating layer and an active layer in sequence after forming the active layer above the grid electrode; manufacturing a photoresistive pattern on the metal material layer, wherein the photoresistive pattern comprises a first photoresistive block and a second photoresistive block with different thicknesses; and etching the metal material layer and the electrode material layer using the photoresistive pattern to form a contact electrode and a pixel electrode, connected to two ends of the active layer, respectively, and a source/drain electrode located on the contact electrode; the manufacturing procedure is simple, a contact resistance between the source/drain electrode and the active layer is effectively reduced and the quality of a product is improved.
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Inventors:
LIU GUANGHUI (CN)
HE PENG (CN)
XU YONG (CN)
AI FEI (CN)
HE PENG (CN)
XU YONG (CN)
AI FEI (CN)
Application Number:
PCT/CN2018/106327
Publication Date:
October 24, 2019
Filing Date:
September 18, 2018
Export Citation:
Assignee:
WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO LTD (CN)
International Classes:
H01L27/12; H01L21/77
Foreign References:
| CN103199060A | 2013-07-10 | |||
| CN102751240A | 2012-10-24 | |||
| US20080199788A1 | 2008-08-21 | |||
| CN101009249A | 2007-08-01 |
Attorney, Agent or Firm:
COMIPS INTELLECTUAL PROPERTY OFFICE (CN)
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