Title:
MASK BLANK AND PROCESS FOR PRODUCTION OF MOLD FOR IMPRINTING USE
Document Type and Number:
WIPO Patent Application WO/2011/129212
Kind Code:
A1
Abstract:
Disclosed is a mask blank which enables the formation of a fine mold pattern with high pattern accuracy in the production of a mold for imprinting use.
Specifically disclosed is a mask blank (10) comprising a light-permeable substrate (1) and a thin film (2) formed in contact with the surface of the substrate, wherein the thin film (2) comprises a laminated film, and wherein the laminated film is composed of an upper layer (4) which comprises a material containing silicon (Si) or a material containing tantalum (Ta) and a lower layer (3) which comprises a material containing at least one of hafnium (Hf) and zirconium (Zr) and containing substantially no oxygen.
Inventors:
NOZAWA, Osamu (7-5 Naka-Ochiai 2-chome, Shinjuku-k, Tokyo 25, 〒1618525, JP)
野澤 順 (〒25 東京都新宿区中落合２丁目７番５号 ＨＯＹＡ株式会社内 Tokyo, 〒1618525, JP)
野澤 順 (〒25 東京都新宿区中落合２丁目７番５号 ＨＯＹＡ株式会社内 Tokyo, 〒1618525, JP)
Application Number:
JP2011/058508
Publication Date:
October 20, 2011
Filing Date:
April 04, 2011
Export Citation:
Assignee:
HOYA CORPORATION (7-5 Naka-Ochiai 2-chome, Shinjuku-ku Tokyo, 25, 〒1618525, JP)
ＨＯＹＡ株式会社 (〒25 東京都新宿区中落合２丁目７番５号 Tokyo, 〒1618525, JP)
NOZAWA, Osamu (7-5 Naka-Ochiai 2-chome, Shinjuku-k, Tokyo 25, 〒1618525, JP)
ＨＯＹＡ株式会社 (〒25 東京都新宿区中落合２丁目７番５号 Tokyo, 〒1618525, JP)
NOZAWA, Osamu (7-5 Naka-Ochiai 2-chome, Shinjuku-k, Tokyo 25, 〒1618525, JP)
International Classes:
H01L21/027; B29C33/38; G11B5/84
Attorney, Agent or Firm:
IKEDA, Noriyasu et al. (Hibiya Daibiru Bldg, 2-2 Uchisaiwaicho 1-chome, Chiyoda-k, Tokyo 11, 〒1000011, JP)
Claims: