Title:
MASK BLANK, TRANSFER MASK, AND METHOD FOR MANUFACTURING TRANSFER MASK
Document Type and Number:
WIPO Patent Application WO/2015/045801
Kind Code:
A1
Abstract:
Provided is a mask blank that makes it possible, during production of a transfer mask, to form an alignment mark between a translucent substrate and a layered structure comprising a semi-light-transmitting film, an etching stopper film, and a light shielding film. A mask blank (100) having a structure in which a semi-light-transmitting film (2), an etching stopper film (3), a light shielding film (4), and an etching mask film (5) are layered on a translucent substrate (1) in the stated order, the mask blank (100) being characterized in that the semi-light-transmitting film (2) and the light shielding film (3) are made of a material that can be dry-etched using a fluorine-based gas, the etching stopper film and the etching mask film are made of a material containing chromium, and the relationship (Dm/Vm) > (Ds/Vs) is satisfied, where the thickness of the etching stopper film is represented by Ds, the rate of etching of the etching stopper film by an oxygen-containing chlorine-based gas is represented by Vs, the thickness of the etching mask film is represented by Dm, and the rate of etching of the etching mask film by the oxygen-containing chlorine-based gas is represented by Vm.
Inventors:
NOZAWA OSAMU (JP)
OHKUBO RYO (JP)
SHISHIDO HIROAKI (JP)
OKUBO YASUSHI (JP)
OHKUBO RYO (JP)
SHISHIDO HIROAKI (JP)
OKUBO YASUSHI (JP)
Application Number:
PCT/JP2014/073498
Publication Date:
April 02, 2015
Filing Date:
September 05, 2014
Export Citation:
Assignee:
HOYA CORP (JP)
International Classes:
G03F1/32; C23F4/00; G03F1/80
Domestic Patent References:
| WO2009123172A1 | 2009-10-08 |
Foreign References:
| JP2007241065A | 2007-09-20 | |||
| JP2007241137A | 2007-09-20 | |||
| JP2009265620A | 2009-11-12 |
Attorney, Agent or Firm:
NAGATA, Yutaka et al. (JP)
Yutaka Nagata (JP)
Yutaka Nagata (JP)
Download PDF: