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Patent Searching and Data


Title:
MASK CLEANING APPARATUS AND MASK CLEANING METHOD
Document Type and Number:
WIPO Patent Application WO/2018/225185
Kind Code:
A1
Abstract:
The cleaning apparatus (100) is a mask cleaning apparatus for removing organic matter adhering to a vapor deposition mask (60) used for forming a thin organic film by vapor deposition, and comprises a dry cleaning device (110) for removing the organic matter by a dry process and a wet cleaning device (120) for removing said organic matter by a wet process.

Inventors:
NAKAI, Chikara
Application Number:
JP2017/021134
Publication Date:
December 13, 2018
Filing Date:
June 07, 2017
Export Citation:
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Assignee:
SHARP KABUSHIKI KAISHA (1 Takumi-cho, Sakai-ku Sakai Cit, Osaka 22, 〒5908522, JP)
International Classes:
C23C14/04; B08B3/08; B08B5/00; H01L51/50; H05B33/10
Attorney, Agent or Firm:
HARAKENZO WORLD PATENT & TRADEMARK (Daiwa Minamimorimachi Building, 2-6 Tenjinbashi 2-chome Kita, Kita-ku, Osaka-sh, Osaka 41, 〒5300041, JP)
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