Title:
MASK, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2008/029917
Kind Code:
A1
Abstract:
Provided is a tube-like mask for forming an image of a pattern on a substrate through a
projection optical system. The mask has a pattern forming surface which is provided
with the pattern formed thereon and is arranged around a prescribed shaft. The
mask can be rotated, in synchronization with shift of the substrate at least in
a prescribed one dimensional direction, with the prescribed shaft as a rotating
shaft, and a condition of D≥(βŒL)/π is satisfied,
where D is the diameter of the mask on the pattern forming surface, L is the maximum
length of the substrate in the one dimensional direction, β is the projection
magnification ratio of the projection optical system, and π is a circular
constant.
Inventors:
SHIBAZAKI, Yuichi (2-3 Marunouchi 3-chome, Chiyoda-k, Tokyo 31, 1008331, JP)
Application Number:
JP2007/067512
Publication Date:
March 13, 2008
Filing Date:
September 07, 2007
Export Citation:
Assignee:
NIKON CORPORATION (2-3 Marunouchi 3-chome, Chiyoda-ku Tokyo, 31, 1008331, JP)
株式会社ニコン (〒31 東京都千代田区丸の内３丁目２番３号 Tokyo, 1008331, JP)
株式会社ニコン (〒31 東京都千代田区丸の内３丁目２番３号 Tokyo, 1008331, JP)
International Classes:
G03F1/14; G03F7/20; H01L21/027
Attorney, Agent or Firm:
SHIGA, Masatake et al. (2-3-1, Yaesu Chuo-ku, Tokyo 53, 1048453, JP)
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