Title:
MASK, EXPOSURE METHOD AND TOUCH PANEL
Document Type and Number:
WIPO Patent Application WO/2021/238342
Kind Code:
A1
Abstract:
A mask (13), an exposure method and a touch panel (170). The mask (13) comprises a first area (130') and a second area (130); the first area (130') is located on at least one side of the second area (130), wherein the first area (130') comprises a first light blocking strip (131'') and a second light blocking strip (131'); the second area (130) comprises a third light blocking strip (131); the extension directions of the first light blocking strip (131''), the second light blocking strip (131'), and the third light blocking strip (131) are the same; the second light blocking strip (131') is located between the first light blocking strip (131'') and the third light blocking strip (131); the first light blocking strip (131''), the second light blocking strip (131'), and the third light blocking strip (131) are configured to block light; gaps formed by a plurality of first light blocking strips (131''), a plurality of second light blocking strips (131'), and a plurality of third light blocking strips (131) allow light to pass through. The width of the first light blocking strip (131'') in the first direction is greater than the width of the second light blocking strip (131') in the first direction, and the width of the second light blocking strip (131') in the first direction is greater than the width of the third light blocking strip (131) in the first direction.
Inventors:
LEI JIE (CN)
ZHENG QITAO (CN)
XU ZOUMING (CN)
WU XINTAO (CN)
LIU CHUNJIAN (CN)
TIAN JIAN (CN)
ZHENG QITAO (CN)
XU ZOUMING (CN)
WU XINTAO (CN)
LIU CHUNJIAN (CN)
TIAN JIAN (CN)
Application Number:
PCT/CN2021/080801
Publication Date:
December 02, 2021
Filing Date:
March 15, 2021
Export Citation:
Assignee:
BOE TECHNOLOGY GROUP CO LTD (CN)
HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO LTD (CN)
HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO LTD (CN)
International Classes:
G03F1/00; G03F7/22
Foreign References:
| CN210573180U | 2020-05-19 | |||
| CN111025842A | 2020-04-17 | |||
| CN106200254A | 2016-12-07 | |||
| CN108761995A | 2018-11-06 | |||
| CN102981356A | 2013-03-20 | |||
| US5364718A | 1994-11-15 | |||
| JP2010113268A | 2010-05-20 |
Other References:
See also references of EP 4009103A4
Attorney, Agent or Firm:
DRAGON INTELLECTUAL PROPERTY LAW FIRM (CN)
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