Title:
MASK INTEGRATION FRAMEWORK AND EVAPORATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/193995
Kind Code:
A1
Abstract:
Provided is a mask integration framework comprising a framework (100) and mask plates (210, 220) fixed to the framework (100), wherein the mask integration framework is provided with an alignment mark (1), and the alignment mark (1) comprise a first alignment hole (101) arranged on the framework (100) and a second alignment hole (211) arranged on the mask plate (210), wherein the first alignment hole (101) is a through-hole; or the first alignment hole (101) is a blind hole, with the deepest position at the bottom of the blind hole not overlapping an orthographic projection of the second alignment hole (211) to the framework (100). Further provided is an evaporation device.
Inventors:
JI FENGLI (CN)
BAI SHANSHAN (CN)
LIANG YINAN (CN)
BAI SHANSHAN (CN)
LIANG YINAN (CN)
Application Number:
PCT/CN2017/084112
Publication Date:
November 16, 2017
Filing Date:
May 12, 2017
Export Citation:
Assignee:
BOE TECHNOLOGY GROUP CO LTD (CN)
ORDOS YUANSHENG OPTOELECTRONICS CO LTD (CN)
ORDOS YUANSHENG OPTOELECTRONICS CO LTD (CN)
International Classes:
C23C14/04; C23C14/24; C23C14/56
Foreign References:
| CN105887010A | 2016-08-24 | |||
| CN105274471A | 2016-01-27 | |||
| CN103866230A | 2014-06-18 | |||
| CN204434718U | 2015-07-01 | |||
| CN103966546A | 2014-08-06 | |||
| CN101965634A | 2011-02-02 |
Attorney, Agent or Firm:
CHINA PATENT AGENT (H.K.) LTD. (CN)
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