Title:
MASK LAYOUT CORRECTION METHOD
Document Type and Number:
WIPO Patent Application WO/2023/134309
Kind Code:
A1
Abstract:
A mask layout correction method, which comprises the following steps: providing an initial mask layout, and acquiring graph point information in the initial mask layout; matching the graph point information in the initial mask layout with defective-point information in a preset mask layout matching library, wherein the mask layout matching library comprises information of mask layout defective points and information of correction points corresponding to the mask layout defective points; and if there is defective-point information that matches certain graph point information in the initial mask layout, correcting the initial mask layout by using the information of the correction point corresponding to the mask layout defective point. The problem of plenty of computing resources being consumed in an existing mask layout correction method is solved.
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Inventors:
JIE HAOYU (CN)
DING MING (CN)
YAN GE (CN)
DING MING (CN)
YAN GE (CN)
Application Number:
PCT/CN2022/133978
Publication Date:
July 20, 2023
Filing Date:
November 24, 2022
Export Citation:
Assignee:
SHENZHEN JINGYUAN INFORMATION TECH CO LTD (CN)
International Classes:
G03F1/36
Foreign References:
| CN114063384A | 2022-02-18 | |||
| CN105223772A | 2016-01-06 | |||
| CN107797375A | 2018-03-13 | |||
| CN108829948A | 2018-11-16 | |||
| CN111474819A | 2020-07-31 | |||
| KR20190003909A | 2019-01-10 | |||
| US20140282299A1 | 2014-09-18 | |||
| US20170205702A1 | 2017-07-20 |
Attorney, Agent or Firm:
SHENZHEN I & W INTELLECTUAL PROPERTY CORPORATION (CN)
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