Title:
MASK LAYOUT METHOD AND APPARATUS, AND MASK
Document Type and Number:
WIPO Patent Application WO/2021/208692
Kind Code:
A1
Abstract:
A mask layout method and apparatus, and a mask. The mask layout method comprises: forming, on a mask (1), chip patterns (11) arranged in an array, a cutting channel (12) being formed between every two adjacent chip patterns (11), the cutting channel (12) being used for arranging a mark pattern (13), and the mark pattern (13) comprising at least a first mark pattern (131); obtaining the set number of segmentation units (131a) of the first mark pattern (131) according to measurement alignment requirements of the first mark pattern (131); sequentially arranging the set number of segmentation units (131a) on the cutting channels (12), such that the first mark pattern (131) does not cover other mark patterns; and providing a first mark pattern cell (131b) to replace at least two adjacent segmentation units (131a), and arranging the first mark pattern cell (131b) on the cutting channel (12), the first marking pattern cell (131b) being completely overlapped with a pattern formed by splicing the at least two adjacent segmentation units (131a). Therefore, the problems that the efficiency of manual layout of mark patterns is low and the accuracy is low can be solved.
Inventors:
LI JING (CN)
Application Number:
PCT/CN2021/082795
Publication Date:
October 21, 2021
Filing Date:
March 24, 2021
Export Citation:
Assignee:
CHANGXIN MEMORY TECH INC (CN)
International Classes:
G03F1/42; G03F1/38
Foreign References:
| JPH10319573A | 1998-12-04 | |||
| CN106292175A | 2017-01-04 | |||
| US20070077666A1 | 2007-04-05 | |||
| JPH01262549A | 1989-10-19 | |||
| JPH02267930A | 1990-11-01 | |||
| JP2006189674A | 2006-07-20 |
Attorney, Agent or Firm:
BEIJING INTELLEGAL INTELLECTUAL PROPERTY AGENT LTD. (CN)
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