Title:
MASK, AND MANUFACTURING METHOD FOR MASK
Document Type and Number:
WIPO Patent Application WO/2022/134818
Kind Code:
A1
Abstract:
Disclosed are a mask and a manufacturing method for the mask, aiming to solve the problem in the prior art of the easy occurrence of color mixing due to the inaccurate position of evaporation when a pattern of a light-emitting substrate is formed by means of a mask. The mask for covering a mother board, which is formed by a multi-division exposure procedure and thus has a substrate invalid region that cannot be exposed due to the multi-division exposure procedure, comprises: a metal frame; a support mask located on one side of the metal frame; at least one fine metal mask strip, which is located on the side of the support mask that faces away from the metal frame, and is provided with multiple openings for the evaporation of a light-emitting film for sub-pixels in the mother board; and a support plate located between the metal frame and the fine metal mask for covering the substrate invalid region, with the thickness of the support plate being greater than that of the support mask.
Inventors:
BI NA (CN)
BAI SHANSHAN (CN)
LIU YUE (CN)
BAI SHANSHAN (CN)
LIU YUE (CN)
Application Number:
PCT/CN2021/125631
Publication Date:
June 30, 2022
Filing Date:
October 22, 2021
Export Citation:
Assignee:
BOE TECHNOLOGY GROUP CO LTD (CN)
International Classes:
C23C14/04; B23P15/00; C23C14/24
Foreign References:
| CN112662995A | 2021-04-16 | |||
| CN111733380A | 2020-10-02 | |||
| CN111676445A | 2020-09-18 | |||
| CN112080720A | 2020-12-15 | |||
| CN110343999A | 2019-10-18 | |||
| CN207775333U | 2018-08-28 | |||
| CN110129723A | 2019-08-16 | |||
| JP2010242141A | 2010-10-28 |
Attorney, Agent or Firm:
TDIP & PARTNERS (CN)
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