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Patent Searching and Data


Title:
MASK AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2021/256548
Kind Code:
A1
Abstract:
Provided are a mask which can be manufactured with less waste of material at high speed, and a method for manufacturing the same. A mask (10) comprises: (a) a mask body (20) having first and second peripheral edges (20p, 20q) extending in a first direction (11), and third and fourth peripheral edges (20u, 20v) extending in a second direction (12) intersecting with the first direction (11); (b) a first over-the-ear part (14a) joined to a first side end section (20m) adjacent to the third peripheral edge (20u) of the mask body (20); and (c) a second over-the-ear part (14b) joined to a second side end section (20n) adjacent to the fourth peripheral edge (20v) of the mask body (20). The first and second over-the-ear parts (14a, 14b) respectively include stretchable members (40a, 40b) extending along the first or second side end section (20m, 20n) and stretchable in the extending direction.

Inventors:
UMEBAYASHI TOYOSHI (JP)
IKEDA NATSUKI (JP)
Application Number:
PCT/JP2021/023122
Publication Date:
December 23, 2021
Filing Date:
June 17, 2021
Export Citation:
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Assignee:
ZUIKO CORP (JP)
International Classes:
A62B18/02; A41D13/11
Foreign References:
JP2011056240A2011-03-24
JP2019002081A2019-01-10
JP2014128387A2014-07-10
JP2010187901A2010-09-02
US20200172274A12020-06-04
Attorney, Agent or Firm:
YAMAMOTO Toshinori (JP)
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