Title:
MASK PACK COMPRISING SYMMETRIC UPPER AND LOWER HALVES
Document Type and Number:
WIPO Patent Application WO/2019/245238
Kind Code:
A1
Abstract:
The present invention provides a structure of a mask pack divided into upper and lower halves. The present invention provides a mask pack divided into upper and lower halves, the mask pack comprising: a first release paper; a first mask laminated on the release paper; and a second mask laminated on the first mask, wherein the first mask and the second mask have common multiple incision patterns. According to the present invention, a mask pack symmetrically divided in half is applicable to an asymmetric facial element.
Inventors:
CHOI YOUNG KWEON (KR)
KIM WAN JUNG (KR)
WOO YONG HO (KR)
AHN SUN YONG (KR)
SHIN BYOUNG MO (KR)
KOO JA YOON (KR)
KIM HO YEOL (KR)
KIM WAN JUNG (KR)
WOO YONG HO (KR)
AHN SUN YONG (KR)
SHIN BYOUNG MO (KR)
KOO JA YOON (KR)
KIM HO YEOL (KR)
Application Number:
PCT/KR2019/007205
Publication Date:
December 26, 2019
Filing Date:
June 14, 2019
Export Citation:
Assignee:
COSMAX INC (KR)
COSMAX ICURE CO LTD (KR)
COSMAX ICURE CO LTD (KR)
International Classes:
A45D44/00; A45D44/22; A61K8/02; A61K8/04; D04H13/00
Foreign References:
| JPH07211U | 1995-01-06 | |||
| KR101773451B1 | 2017-09-01 | |||
| KR20150096978A | 2015-08-26 | |||
| KR20100129096A | 2010-12-08 |
Other References:
ANONYMOUS: "Sampar Pack vs. Cel-derma Pack Season 4", DANAWA MASK PACK EXPERIENCE GROUP, 21 December 2011 (2011-12-21), pages 1 - 19, XP055665136, Retrieved from the Internet
Attorney, Agent or Firm:
HMP IP GROUP (KR)
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