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Patent Searching and Data


Title:
MASK PLATE, AND MANUFACTURING METHOD AND EVAPORATION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2019/051931
Kind Code:
A1
Abstract:
Disclosed are a mask plate (30), and a manufacturing method and an evaporation method therefor. The mask plate (30) comprises a mask plate body (31) and evaporation holes (32) and bulges (33) formed on the mask plate body (31), wherein the evaporation holes (32) penetrate through the mask plate body (31), and the bulges (33) are arranged on edges of the evaporation holes (32), thus facilitating the reduction of an externally-expanding region (64) around a pixel sub-region (63), thereby improving the evaporation quality and reducing the risk of color mixture of adjacent pixels.

Inventors:
JIANG LIANG (CN)
Application Number:
PCT/CN2017/107134
Publication Date:
March 21, 2019
Filing Date:
October 20, 2017
Export Citation:
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Assignee:
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECH CO LTD (CN)
International Classes:
C23C14/24; C23C14/04; H01L27/32; H01L51/56
Foreign References:
CN106816554A2017-06-09
CN105714249A2016-06-29
CN105154823A2015-12-16
CN104062842A2014-09-24
CN104561895A2015-04-29
CN202786401U2013-03-13
US20020025406A12002-02-28
Attorney, Agent or Firm:
CHINA WISPRO INTELLECTUAL PROPERTY LLP. (CN)
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