Title:
MASK PLATE AND PHOTO-ALIGNMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2017/161644
Kind Code:
A1
Abstract:
Disclosed is a mask plate (4), comprising a plurality of baffles (5), a frame body (6) and a light-transmitting region (7). The frame body (6) is provided with supporting components (8) and moving components (9). The baffles (5) are configured to shield the light-transmitting region (7). The supporting components (8) are configured to support the baffles (5) shielding the light-transmitting region (7). The moving components (9) are configured to move the baffles (5) to positions for shielding the light-transmitting region (7). With the mask plate (4), one piece of mask plate (4) can be applied to producing different MMG products; and in a production process, the mask plate (4) can carry out irradiation orientation without being replaced; and the mask plate (4) does not need to be unloaded in the range of normal service life, thereby optimizing the production process and effectively reducing the costs.
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Inventors:
MA GUOJING (CN)
XU CHANGJIAN (CN)
WANG DAN (CN)
XU CHANGJIAN (CN)
WANG DAN (CN)
Application Number:
PCT/CN2016/081104
Publication Date:
September 28, 2017
Filing Date:
May 05, 2016
Export Citation:
Assignee:
BOE TECHNOLOGY GROUP CO LTD (CN)
BEIJING BOE DISPLAY TECH CO (CN)
BEIJING BOE DISPLAY TECH CO (CN)
International Classes:
G02F1/1337; G03F1/00
Foreign References:
| CN102466963A | 2012-05-23 | |||
| CN202372754U | 2012-08-08 | |||
| US20020051915A1 | 2002-05-02 | |||
| CN103336389A | 2013-10-02 | |||
| CN203117640U | 2013-08-07 | |||
| CN104267542A | 2015-01-07 |
Attorney, Agent or Firm:
ZHONGZI LAW OFFICE (CN)
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