Title:
MASK PLATE, STITCHING EXPOSURE METHOD, DISPLAY PANEL, AND MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2018/068441
Kind Code:
A1
Abstract:
A mask plate (30), a stitching exposure method, a display panel, and a manufacturing method. The mask plate (30) is used for manufacturing scan lines (21) or data lines (22) of a display panel by means of exposure; the mask plate (30) is provided with a pattern area (31) and a slit area (32) located outside the pattern area (31); multiple exposure lines (33) parallel to each other are provided in the pattern area (31); the multiple exposure lines (33) are respectively continuous lines and used for manufacturing the scan lines (21) or the data lines (22) by means of exposure; the slit area (32) is provided with a slit (34); the slit (34) is used for disconnecting each scan line (21) or data line (22) from an intermediate position by means of exposure. The mask plate (30) and the stitching exposure method can achieve disconnection of a scan line (21) or a data line (22) from an intermediate position in an exposure process, are suitable for manufacturing a large-size display panel, and can reduce manufacturing difficulty and production costs.
Inventors:
ZHOU LIUFEI (CN)
WANG JIE (CN)
WANG JIE (CN)
Application Number:
PCT/CN2017/072471
Publication Date:
April 19, 2018
Filing Date:
January 24, 2017
Export Citation:
Assignee:
NANJING CEC PANDA LCD TECH CO LTD (CN)
International Classes:
G03F1/00
Foreign References:
| CN102819183A | 2012-12-12 | |||
| CN1362642A | 2002-08-07 | |||
| CN203337996U | 2013-12-11 | |||
| CN101650525A | 2010-02-17 | |||
| KR20110058353A | 2011-06-01 |
Attorney, Agent or Firm:
PSHIP FIRM, LLC (CN)
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