Title:
MASK, MASK PRODUCING METHOD AND EXPOSURE METHOD
Document Type and Number:
WIPO Patent Application WO/2004/040626
Kind Code:
A1
Abstract:
A pattern transfer mask (10) is produced with a correction including at least one of XY-direction magnification and orthogonality carried out so that a circuit pattern (P) overlaps on all the defects (DF) of a mask blank as an intermediate material before pattern forming. Accordingly, a defective mask blank can be used for producing a mask to reduce costs. At exposing, an exposure is made such that an original design pattern is restored by carrying out a correction reverse to the above correction by at least one of a projection optical system and a stage operation.
Inventors:
Ota, Kazuya c/o NIKON CORPORATION (2-3 Marunouchi 3-Chom, Chiyoda-ku Tokyo, 100-8331, JP)
Application Number:
PCT/JP2003/013825
Publication Date:
May 13, 2004
Filing Date:
October 29, 2003
Export Citation:
Assignee:
NIKON CORPORATION (2-3 Marunouchi 3-Chome, Chiyoda-ku, Tokyo, 100-8331, JP)
Ota, Kazuya c/o NIKON CORPORATION (2-3 Marunouchi 3-Chom, Chiyoda-ku Tokyo, 100-8331, JP)
Ota, Kazuya c/o NIKON CORPORATION (2-3 Marunouchi 3-Chom, Chiyoda-ku Tokyo, 100-8331, JP)
International Classes:
G03F1/00; G03F7/20; (IPC1-7): H01L21/027; G03F1/08
Attorney, Agent or Firm:
Hosoe, Toshiaki (Corpo Fuji 605, 3-6 Nishikanagawa 1-Chome, Kanagawa-k, Yokohama-Shi Kanagawa, 221-0822, JP)
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