MASK STRIP AND FABRICATION METHOD THEREOF AND MASK PLATE

Title:

MASK STRIP AND FABRICATION METHOD THEREOF AND MASK PLATE

Document Type and Number:

WIPO Patent Application WO/2019/037387

Kind Code:

A1

Abstract:

A mask strip, comprising: a plurality of mask units (2) in a first direction; each of the mask units (2) comprising a mask region (3) and a non-mask region (11) surrounding the mask region (3), the non-mask region (11) comprising a side region (4) and an original stress concentration region (6) inside the side region (4); each of the mask units (2) further comprising a stress concentration structure, wherein the stress concentration structure is within a part of the side region (4) other than the original stress concentration region (6). Also discloses a mask plate and a method of fabricating a mask strip.

Inventors:

ZHANG JIAN (CN)
HUANG CHUN CHIEH (CN)
LIN ZHIMING (CN)
ZHANG XINJIAN (CN)
WANG QI (CN)
HAO ZHIYUAN (CN)
ZHANG DE (CN)
LIU DEJIAN (CN)
WANG ZHEN (CN)
SUN PU (CN)

Application Number:

PCT/CN2018/073790

Publication Date:

February 28, 2019

Filing Date:

January 23, 2018

Export Citation:

Click for automatic bibliography generation Help

Assignee:

BOE TECHNOLOGY GROUP CO LTD (CN)
ORDOS YUANSHENG OPTOELECTRONICS CO LTD (CN)

International Classes:

C23C14/04; C23C14/24; H01L51/56

Domestic Patent References:

WO2017014016A1

2017-01-26

Foreign References:

US20110229633A1	2011-09-22
TWM288696U	2006-03-11
CN103572205A	2014-02-12
CN104593721A	2015-05-06
CN104846328A	2015-08-19
CN105039905A	2015-11-11
CN106158697A	2016-11-23
CN206033864U	2017-03-22
US20150013600A1	2015-01-15
KR20030027167A	2003-04-07
US20120279444A1	2012-11-08
US20150007768A1	2015-01-08
CN204434717U	2015-07-01
US20150376765A1	2015-12-31
US20180065162A1	2018-03-08
EP3144410A1	2017-03-22

Other References: