Title:
MASK UNIT AND SUBSTRATE PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2013/157356
Kind Code:
A1
Abstract:
A mask unit comprises: a mask holding unit (20) which holds a mask pattern on a cylindrical surface with a prescribed radius centered on a first axial line (AX1) and is rotatable around the first axial line; a support unit (22) for supporting the mask holding unit in a contactless or low friction state so that the mask holding unit is able to rotate around and move in the direction of the first axial line; and a pair of driving units (MT) which is provided on both sides in the first axial line direction of the mask holding unit and drives the mask holding unit by propelling the mask holding unit to rotate around the first axial line.
Inventors:
SUZUKI TOMONARI (JP)
Application Number:
PCT/JP2013/058686
Publication Date:
October 24, 2013
Filing Date:
March 26, 2013
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
G03F7/24; G03F7/20; H01L21/027; H01L21/683
Domestic Patent References:
| WO2008029917A1 | 2008-03-13 |
Foreign References:
| JP2012032837A | 2012-02-16 | |||
| JP2009026933A | 2009-02-05 | |||
| JP2004258619A | 2004-09-16 | |||
| JP2004258205A | 2004-09-16 | |||
| JPS6019037U | 1985-02-08 | |||
| JP2003181365A | 2003-07-02 | |||
| JP2003071360A | 2003-03-11 | |||
| JP2000056400A | 2000-02-25 | |||
| JPH0199798A | 1989-04-18 | |||
| JP2005169305A | 2005-06-30 |
Attorney, Agent or Firm:
SHIGA Masatake et al. (JP)
Masatake Shiga (JP)
Masatake Shiga (JP)
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