Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
MASK
Document Type and Number:
WIPO Patent Application WO/2007/010967
Kind Code:
A1
Abstract:
[PROBLEMS] To provide a less napped mask. [MEANS FOR SOLVING THE PROBLEMS] This mask is so formed that all or a part of the surface of the body part of the mask which is brought into contact with the face of a user is soaked with a smoothing agent. The body part covers the objective portion of the face of the user having the nose and the mouth of the user.

Inventors:
FUJITA MASAYA (JP)
Application Number:
PCT/JP2006/314351
Publication Date:
January 25, 2007
Filing Date:
July 20, 2006
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
DAIO SEISHI KK (JP)
FUJITA MASAYA (JP)
International Classes:
A62B18/02
Foreign References:
JPH07148280A1995-06-13
JPH11128378A1999-05-18
JP3098649U2004-03-11
Attorney, Agent or Firm:
NAGAI, Yoshihisa (3-2 Kajicho 2-chome, Chiyoda-k, Tokyo 44, JP)
Download PDF:
View/Download PDF      PDF Help



 
Previous Patent: METHOD FOR IMPROVING ADHESIVENESS OF ELECTROLESS COPPER PLATING FILM

Next Patent: MASK