Title:
MASK
Document Type and Number:
WIPO Patent Application WO/2019/022020
Kind Code:
A1
Abstract:
The present disclosure provides a mask which, when in use, easily reduces discomfort on a wearer's face and has an excellent wearing feel. A mask (1) is provided with a mask body (3), which has a longitudinal direction (L) and a transverse direction (C), and ear-hook parts (5). The mask body (3) is provided with a skin-facing surface (S1) and a non-skin-facing surface (S2), and has: fabric (9) forming part of the skin-facing surface (S1); and a nose cover part (39) comprising synthetic fabric and extending in the longitudinal direction (L) from a top periphery part (3A) that extends in the transverse direction (C) so as to cover the wearer's nose. The mean coefficient of friction (MIU) of the skin-facing surface of the synthetic fabric is 0.09-0.20, and the mean deviation of coefficient of friction (MMD) is 0.005-0.015. The MIU of the skin-facing surface of the fabric (9) is more than 0.25, or the MMD is more than 0.015.
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Inventors:
WAKASUGI KEI (JP)
SHIBATA AKIRA (JP)
NAKAMURA YUSUKE (JP)
SHIBATA AKIRA (JP)
NAKAMURA YUSUKE (JP)
Application Number:
PCT/JP2018/027540
Publication Date:
January 31, 2019
Filing Date:
July 23, 2018
Export Citation:
Assignee:
UNICHARM CORP (JP)
International Classes:
A41D13/11; A62B18/02
Foreign References:
| JP3156690U | 2010-01-14 | |||
| JP2017089067A | 2017-05-25 | |||
| JP2009056194A | 2009-03-19 | |||
| JPH10258065A | 1998-09-29 | |||
| JP2007021025A | 2007-02-01 | |||
| JP2015229815A | 2015-12-21 | |||
| JP2014000106A | 2014-01-09 |
Attorney, Agent or Firm:
AOKI, Atsushi et al. (JP)
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