Title:
MASK
Document Type and Number:
WIPO Patent Application WO/2019/024193
Kind Code:
A1
Abstract:
Provided is a mask. The mask comprises an alignment zone (101). The alignment zone (101) is used for obtaining a preset reflectivity under illumination with certain intensity for alignment. The alignment zone (101) is subjected to reflection treatment, and thus the mask has the reflectivity with the same range with the preset reflectivity. Through the reflection treatment, when masks of different types are aligned, the same picture definition matched with the corresponding masks can be achieved without adjusting the light source intensity or picture contrast, manual operation is reduced, and the production efficiency is improved.
Inventors:
JIANG QIAN (CN)
CHEN YUNGSHENG (CN)
CHEN YUNGSHENG (CN)
Application Number:
PCT/CN2017/102584
Publication Date:
February 07, 2019
Filing Date:
September 21, 2017
Export Citation:
Assignee:
WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECH CO LTD (CN)
International Classes:
C23C14/04; G03F1/00; G03F1/38; G03F1/42; H01L51/56
Foreign References:
JP2016053194A | 2016-04-14 | |||
CN104865789A | 2015-08-26 | |||
CN104503203A | 2015-04-08 | |||
CN101458443A | 2009-06-17 | |||
JP2000238447A | 2000-09-05 | |||
JP2000311852A | 2000-11-07 |
Attorney, Agent or Firm:
CHINA WISPRO INTELLECTUAL PROPERTY LLP. (CN)
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