Title:
MASS FLOW CONTROLLER WITH ENHANCED OPERATING RANGE
Document Type and Number:
WIPO Patent Application WO/2011/125339
Kind Code:
A1
Abstract:
A mass flow controller among other embodiments and method is described. The mass flow controller including a thermal mass flow sensor including at least two sensing elements coupled to a sensor tube of the mass flow controller, the thermal mass flow sensor being designed to provide a first signal indicative of flow of a gas within a first flow-rate-range and a second signal indicative of flow of the gas within a second flow-rate-range; and a control portion figured to control a valve position of the mass flow controller responsive to the first signal when the flow of the gas is within the first flow-rate-range and control the valve position of the mass flow controller responsive to the second signal when the flow of the gas is within a second flow-rate-range.
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Inventors:
ZOLOCK, J. Michael (2132 Elmwood St, Berthoud Colorado, 80513, US)
SMIRNOV, V. Alexei (931 Mansfield Dr, Fort Collins Colorado, 80525, US)
SMIRNOV, V. Alexei (931 Mansfield Dr, Fort Collins Colorado, 80525, US)
Application Number:
JP2011/002096
Publication Date:
October 13, 2011
Filing Date:
April 08, 2011
Export Citation:
Assignee:
HITACHI METALS, LTD. (2-1 Shibaura 1-Chome, Minato-ku Tokyo, 14, 10586, JP)
ZOLOCK, J. Michael (2132 Elmwood St, Berthoud Colorado, 80513, US)
SMIRNOV, V. Alexei (931 Mansfield Dr, Fort Collins Colorado, 80525, US)
ZOLOCK, J. Michael (2132 Elmwood St, Berthoud Colorado, 80513, US)
SMIRNOV, V. Alexei (931 Mansfield Dr, Fort Collins Colorado, 80525, US)
International Classes:
G01F1/696; G01F7/00; G05D7/06
Attorney, Agent or Firm:
OHNO, Seiji et al. (OHNO & PARTNERS, Marunouchi Kitaguchi Building 21F6-5, Marunouchi 1-chom, Chiyoda-ku Tokyo 05, 10000, JP)
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Claims:
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