MATERIAL TREATING SYSTEM, MATERIAL TREATING METHOD AND CORRESPONDING GAS SUPPLY

Title:

MATERIAL TREATING SYSTEM, MATERIAL TREATING METHOD AND CORRESPONDING GAS SUPPLY

Document Type and Number:

WIPO Patent Application WO2003071578

Kind Code:

A3

Abstract:

The invention relates to a material treating system for treating a work piece (3). The material treatment is carried out by supplying a reaction gas and energetic radiation to induce the reaction gas in a surrounding of a section of the work piece to be treated. The radiation is preferably provided by an electron microscope (15). An objective lens (27) of the electron microscope is disposed preferably between a detector (41) thereof and the work piece. A gas supply system (53) of the material treating system is provided with a valve disposed at a distance from the treating section, and a gas volume between the valve and a location of emergence (59) of the reaction gas is small. The gas supply system is further provided with a temperature-adjusted, especially cooled reservoir for receiving a starting material for the reaction gas.

Inventors:

KOOPS HANS W P (DE)
HOFFROGGE PETER (DE)

Application Number:

PCT/EP2003/001923

Publication Date:

January 08, 2004

Filing Date:

February 25, 2003

Export Citation:

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Assignee:

LEO ELEKTRONENMIKROSKOPIE GMBH (DE)
NAWOTEC GMBH (DE)
KOOPS HANS W P (DE)
HOFFROGGE PETER (DE)

International Classes:

H01J37/18; H01J37/30; H01J37/305; (IPC1-7): H01J37/305; H01J37/301

Domestic Patent References:

WO2002019375A1

2002-03-07

Foreign References:

US5055696A	1991-10-08
US5188705A	1993-02-23
US5148024A	1992-09-15
US5885354A	1999-03-23
US5645897A	1997-07-08

Other References: