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Patent Searching and Data


Title:
MEASUREMENT DEVICE, METHOD AND DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/130304
Kind Code:
A1
Abstract:
The present invention addresses the problem of, in an overlay measurement method that uses a reference image, calculating the amount of overlay without an ideal reference image. A measurement device described in a specific embodiment of the present invention is characterized by comprising: an image capture unit which captures an image of a circuit pattern on the surface of a semiconductor wafer by an optical microscope or an electron microscope; a pattern recognition unit (2001) which extracts a first pattern and a second pattern from the image captured by the image capture unit; a reference image generation unit (2002) which synthesizes a first reference image using the first patterns extracted from the plurality of images, and synthesizes a second reference image using the second patterns extracted from the plurality of images; a quantification unit (2003) which quantifies a first difference that is a difference between the first reference image and the first pattern, and a second difference that is a difference between the second reference image and the second pattern; and a calculation unit (2004) which calculates the amount of overlay included in the circuit pattern using the first difference and the second difference.

Inventors:
TAKAGI YUJI (JP)
FUKUNAGA FUMIHIKO (JP)
GOTO YASUNORI (JP)
Application Number:
PCT/JP2016/052225
Publication Date:
August 03, 2017
Filing Date:
January 27, 2016
Export Citation:
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Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
G03F9/00; H01J37/22; H01L21/66
Foreign References:
JP2013168595A2013-08-29
JP2009194051A2009-08-27
Attorney, Agent or Firm:
TODA Yuji (JP)
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