Title:
MEASUREMENT DEVICE AND MEASUREMENT METHOD, EXPOSURE DEVICE AND EXPOSURE METHOD, AND DEVICE PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2016/104511
Kind Code:
A1
Abstract:
In the present invention, an alignment system is provided with an alignment system (50) that includes: an objective optical system (60) having an objective transparent plate (62) which faces a wafer (W) that can move in a Y-axis direction; a projection system (70) that scans measurement light (L1, L2) in the Y-axis direction and while doing so projects the measurement light (L1, L2), via the objective transparent plate (62), onto grid marks (GM) disposed on the wafer (W); and a light receiving system (80) that receives, via the objective optical system (60), diffraction light ±L3, ±L4 which is from the grid marks (GM) and is of the measurement light (L1, L2). The alignment system is also provided with a calculation system that finds position information of the gird mark (GM) on the basis of the output of the light receiving system (80). The objective transparent plate (62) deflects or diffracts the diffraction light ±L3, ±L4, which was diffracted by the grid marks (GM), towards the light receiving system (80).
Inventors:
UEDA AKIHIRO (JP)
Application Number:
PCT/JP2015/085848
Publication Date:
June 30, 2016
Filing Date:
December 22, 2015
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
G03F9/00; G01B11/00; G03F7/20
Foreign References:
| JP2012175103A | 2012-09-10 | |||
| JP2001250766A | 2001-09-14 | |||
| JPH05180667A | 1993-07-23 | |||
| JP2004022698A | 2004-01-22 | |||
| JPH1022207A | 1998-01-23 | |||
| JPH05152188A | 1993-06-18 | |||
| JPH03226608A | 1991-10-07 |
Other References:
See also references of EP 3239776A4
Attorney, Agent or Firm:
TATEISHI, Atsuji (JP)
Tokuji Tateishi (JP)
Tokuji Tateishi (JP)
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