Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
MEASUREMENT DEVICE AND MEASUREMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2016/174996
Kind Code:
A1
Abstract:
The amount of time that a subject is under the static magnetic field of a rotating-type MRI device is dependent on the rotational-direction width of a magnet. Conventional rotating-type MRI devices require that the width of the magnet be altered in order to alter the amount of time that the subject is under the static magnetic field. Provided is a measurement device that is provided with: a first magnet that is provided in a first range that is on a circle that is centered on a rotating shaft; a second magnet that is provided in a second range that is on a circle that is centered on the rotating shaft, the second range being different from the first range; a drive unit that rotates the first magnet and the second magnet around the rotating shaft; a measurement unit that is for measuring a measurement target that is in an installation position to which is applied a first magnetic field that is generated by the first magnet as a result of the rotation of the rotating shaft and a second magnetic field that is generated by the second magnet as a result of the rotation of the rotating shaft; and a control unit that, while the measurement target is being measured, changes the rotating speed of the rotating shaft in accordance with the position of the first magnet and the second magnet with respect to the installation position.

Inventors:
UTSUMI HIDEO (JP)
KAJIWARA HIDENORI (JP)
OHKUBO YUJI (JP)
Application Number:
PCT/JP2016/060972
Publication Date:
November 03, 2016
Filing Date:
April 01, 2016
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
UNIV KYUSHU NAT UNIV CORP (JP)
FUJI ELECTRIC CO LTD (JP)
MEIKO CO LTD (JP)
International Classes:
A61B5/055; G01N24/10; G01N24/12
Domestic Patent References:
WO2004069052A12004-08-19
Foreign References:
JPH10229976A1998-09-02
Attorney, Agent or Firm:
RYUKA IP LAW FIRM (JP)
Ryuka international patent business corporation (JP)
Download PDF: