MEASUREMENT METHOD, IMAGE PROCESSING DEVICE, AND CHARGED PARTICLE BEAM DEVICE

Title:

MEASUREMENT METHOD, IMAGE PROCESSING DEVICE, AND CHARGED PARTICLE BEAM DEVICE

Document Type and Number:

WIPO Patent Application WO/2013/180043

Kind Code:

A1

Abstract:

It is impossible to correct the error of an outline point due to brightness variations by a simple method such as the addition of a certain amount of offset. In recent years in which sizes are increasingly reduced as typified by resist patterns, however, it is difficult to appropriately determine a reference region. From an image of a resist pattern, obtained by a charged particle beam device, an outline of the resist pattern is extracted in consideration of the effect of brightness variations. That is, a plurality of brightness profiles in the neighborhood of an edge point constituting the outline are obtained, the evaluation value of the shape of a brightness profile in the neighborhood of a specific edge is obtained based on said plurality of brightness profiles, and the outline of the specific edge point is corrected based on this evaluation value.

Inventors:

OHASHI TAKEYOSHI (JP)
TANAKA JUNICHI (JP)
HOJO YUTAKA (JP)
SHINDO HIROYUKI (JP)
KAWADA HIROKI (JP)

Application Number:

PCT/JP2013/064571

Publication Date:

December 05, 2013

Filing Date:

May 27, 2013

Export Citation:

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Assignee:

HITACHI HIGH TECH CORP (JP)

International Classes:

G01B15/04

Foreign References:

JP2005174929A	2005-06-30
JP2005283139A	2005-10-13
JP2011220735A	2011-11-04
JP2009204374A	2009-09-10
JP2012002765A	2012-01-05