Title:
MEASURING METHOD AND MEASURING ARRANGEMENT FOR AN IMAGING OPTICAL SYSTEM
Document Type and Number:
WIPO Patent Application WO/2016/184571
Kind Code:
A3
Abstract:
The invention relates to a method for measuring a wavefront error of an imaging optical system (10) of a projection lithography system for microlithography. The method consists of measuring separately respective wavefront errors of different sub-arrangements (M1; M2; M3; M1, M3) of the optical elements.
Inventors:
WEGMANN ULRICH (DE)
STIEPAN HANS-MICHAEL (DE)
HETZLER JOCHEN (DE)
STIEPAN HANS-MICHAEL (DE)
HETZLER JOCHEN (DE)
Application Number:
PCT/EP2016/000832
Publication Date:
December 29, 2016
Filing Date:
May 19, 2016
Export Citation:
Assignee:
ZEISS CARL SMT GMBH (DE)
International Classes:
G02B7/00; G01M11/02; G03F7/20
Foreign References:
| US20050105044A1 | 2005-05-19 | |||
| US20110205514A1 | 2011-08-25 | |||
| EP0631129A1 | 1994-12-28 | |||
| DE102006014510A1 | 2006-10-19 | |||
| DE19818341A1 | 1999-10-28 |
Attorney, Agent or Firm:
SUMMERER, Christian (Nußbaumstrasse 8, München, DE)
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