Title:
MEDLAR MODIFICATION PROCESSING DEVICE AND PROCESSING METHOD
Document Type and Number:
WIPO Patent Application WO/2020/181631
Kind Code:
A1
Abstract:
A medlar modification processing device, comprising a vacuum processing unit and a plasma discharge unit provided inside the vacuum processing unit, wherein the vacuum processing unit comprises a vacuum container (1) for accommodating medlar, and a gas adjustment assembly in communication with the vacuum container for adjusting the vacuum degree of the vacuum container; and the plasma discharge unit comprises at least one plasma discharge assembly provided in the vacuum container. Further provided is a medlar modification processing method.
Inventors:
ZHANG BO (CN)
LU YAN (CN)
LIU DONGTING (CN)
WEI YINGYING (CN)
YANG TONG (CN)
DONG HEJIAN (CN)
XU GUICAI (CN)
LIU CHEN (CN)
LU YAN (CN)
LIU DONGTING (CN)
WEI YINGYING (CN)
YANG TONG (CN)
DONG HEJIAN (CN)
XU GUICAI (CN)
LIU CHEN (CN)
Application Number:
PCT/CN2019/084417
Publication Date:
September 17, 2020
Filing Date:
April 26, 2019
Export Citation:
Assignee:
CHANGZHOU VOCATIONAL INSTITUTE OF MECHATRONIC TECH (CN)
International Classes:
A23L33/10; A23B7/015; A23L5/20; A23L5/30
Foreign References:
| CN105146234A | 2015-12-16 | |||
| CN105495067A | 2016-04-20 | |||
| US20130189156A1 | 2013-07-25 |
Attorney, Agent or Firm:
CHANGZHOU KEYI PATENT AGENCY (CN)
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