Title:
MEMBER FOR PLASMA PROCESSING DEVICES
Document Type and Number:
WIPO Patent Application WO/2019/022244
Kind Code:
A1
Abstract:
A member for plasma processing devices according to the present disclosure is a cylindrical body that is formed from a ceramic and has a through hole in the axial direction. The ceramic is mainly composed of aluminum oxide, and has a plurality of crystal grains and a grain boundary phase that is present among the crystal grains. The inner circumferential surface of the cylindrical body has an arithmetic mean roughness Ra of from 1 μm to 3 μm (inclusive) and an arithmetic height Rmax of from 30 μm to 130 μm (inclusive).
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Inventors:
MATSUFUJI HIROMASA (JP)
Application Number:
PCT/JP2018/028321
Publication Date:
January 31, 2019
Filing Date:
July 27, 2018
Export Citation:
Assignee:
KYOCERA CORP (JP)
International Classes:
C04B35/117; C04B41/80; C23C16/44; C23F4/00; H01L21/3065
Foreign References:
| JP2001250814A | 2001-09-14 | |||
| JP2008156160A | 2008-07-10 | |||
| JPH10167859A | 1998-06-23 |
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