Title:
MEMBER FOR SEMICONDUCTOR-MANUFACTURING DEVICE
Document Type and Number:
WIPO Patent Application WO/2024/004147
Kind Code:
A1
Abstract:
In the present invention, a wafer placement table 10 comprises a gas outflow passage 56, a gas common passage 54, and a gas inflow passage 52. The gas outflow passage 56 is open to a wafer placement surface 21, and a plurality of gas outflow passages are provided to the wafer placement table 10. The gas common passage 54 is provided in an interior of the wafer placement table 10 and is in communication with the plurality of gas outflow passages 56. The gas inflow passage 52 is in communication with the gas common passage 54 from a surface of the wafer placement table 10, said surface being on the opposite side from the wafer placement surface 21. The number of gas inflow passages 52 is lower than the number of gas outflow passages 56 that are in communication with the gas common passage 54. Among the plurality of gas outflow passages 56, passages that are closer to the gas inflow passage 52 have a greater gas passing resistance compared to passages that are farther from the gas inflow passage 52.
Inventors:
KOJIMA MITSURU (JP)
TAKEBAYASHI HIROSHI (JP)
WAKI JYUNYA (JP)
TAKEBAYASHI HIROSHI (JP)
WAKI JYUNYA (JP)
Application Number:
PCT/JP2022/026285
Publication Date:
January 04, 2024
Filing Date:
June 30, 2022
Export Citation:
Assignee:
NGK INSULATORS LTD (JP)
International Classes:
H01L21/683; H01L21/3065
Foreign References:
| JP2014049685A | 2014-03-17 | |||
| JP2019117861A | 2019-07-18 | |||
| JP3182120U | 2013-03-07 | |||
| JP2020057786A | 2020-04-09 | |||
| JP2009158829A | 2009-07-16 | |||
| US6024631A | 2000-02-15 |
Attorney, Agent or Firm:
ITEC INTERNATIONAL PATENT FIRM (JP)
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