Title:
MEMBER FOR USE IN PLASMA TREATMENT DEVICE, AND PLASMA TREATMENT DEVICE PROVIDED THEREWITH
Document Type and Number:
WIPO Patent Application WO/2019/160122
Kind Code:
A1
Abstract:
This member for use in a plasma treatment device is provided with a substrate, and, on at least part of the substrate, a film of an oxide of a rare earth element. The film thickness has a coefficient of variation of less than or equal to 0.04. This plasma treatment device is provided with the aforementioned member for use in a plasma treatment device. The member for use in a plasma treatment device has low film thickness variability.
Inventors:
ISHIKAWA KAZUHIRO (JP)
HINO TAKASHI (JP)
SAITO SHUICHI (JP)
HINO TAKASHI (JP)
SAITO SHUICHI (JP)
Application Number:
PCT/JP2019/005710
Publication Date:
August 22, 2019
Filing Date:
February 15, 2019
Export Citation:
Assignee:
KYOCERA CORP (JP)
TOSHIBA MATERIALS CO LTD (JP)
TOSHIBA MATERIALS CO LTD (JP)
International Classes:
C23C14/08; H01L21/3065; H05H1/46; C04B35/111; C04B41/87
Foreign References:
| JP2003297809A | 2003-10-17 | |||
| CN107313015A | 2017-11-03 | |||
| JP2005217349A | 2005-08-11 |
Other References:
See also references of EP 3754046A4
Attorney, Agent or Firm:
SAIKYO, Keiichiro (JP)
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