MEMBRANE STRUCTURE ELEMENT AND METHOD FOR MANUFACTURING SAME

WIPO Patent Application WO/2007/114191

A1

A membrane structure element which can be easily manufactured, has excellent insulating characteristics and a high quality is provided. A method for manufacturing such membrane structure element is also provided. The membrane structure element is provided with a membrane formed of a silicon oxide film, and a substrate for supporting the membrane in a hollow status by supporting a part of the periphery of the membrane. The method for manufacturing such membrane is provided with a film forming step of forming a heat-shrinkable silicon oxide film (13) on the surface side of a silicon substrate (2) by plasma CVD method; a heat treatment step of performing heat treatment for making the silicon oxide film (13) formed on the substrate (1) shrink with heat; and a removing step of removing a part of the substrate (2) so that a corresponding part of the silicon oxide film (13) to the membrane is supported as a membrane to the substrate (2) in the hollow status, and forming a recessed section (4).

HIRANO TAKAYUKI
KAWAKAMI NOBUYUKI
KANNAKA MASATO

PCT/JP2007/056723

October 11, 2007

March 28, 2007

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KOBE STEEL LTD (JP)
HIRANO TAKAYUKI
KAWAKAMI NOBUYUKI
KANNAKA MASATO

H01L37/00; B81C1/00; C23C16/42; G01F1/692; H01L35/34; G01J1/02

JP2004353070A	2004-12-16
JPH08264844A	1996-10-11
JPH06132277A	1994-05-13
JPH11274067A	1999-10-08
JPH09306812A	1997-11-28
JPH07135157A	1995-05-23
JPH06132277A	1994-05-13
JPH08264844A	1996-10-11

See also references of EP 2001062A4
LIE-YI SHENG ET AL., TRANSDUCERS '97, 1997, pages 939 - 942

OGURI, Shohei et al. (7-13 Nishi-Shimbashi 1-chom, Minato-ku Tokyo 03, JP)

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