Title:
MEMS ELEMENT AND METHOD FOR MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2010/122953
Kind Code:
A1
Abstract:
An acceleration sensor (1) is formed by using an etching layer (4) sandwiched between first and second substrates (2, 3). At this time, a structural part (A), which is provided with a movable portion (7) that can be displaced in the thickness direction of the substrates (2, 3), and a supporting frame (9) are formed on the etching layer (4). Furthermore, on the first and second substrates (2, 3), first and second fixed electrodes (10, 12) are formed at positions facing the movable portion (7). The substrate (2) is provided with a remaining sacrificial layer (16) which is a remaining portion of a second sacrificial layer (23) obtained when the entire first sacrificial layer (22) is removed by etching. Thus, since the second sacrificial layer (23) is preferentially corroded compared with the structural part (A) and the like at the time of removing the first sacrificial layer (22) by etching, corrosion of the structural part (A) and a supporting beam (9) can be eliminated.
Inventors:
YOSHIDA JUNICHI (JP)
Application Number:
PCT/JP2010/056816
Publication Date:
October 28, 2010
Filing Date:
April 16, 2010
Export Citation:
Assignee:
MURATA MANUFACTURING CO (JP)
YOSHIDA JUNICHI (JP)
YOSHIDA JUNICHI (JP)
International Classes:
B81B3/00; B81C1/00; G01P15/125
Foreign References:
| JP2005514728A | 2005-05-19 | |||
| JP2005534505A | 2005-11-17 | |||
| JP2006095607A | 2006-04-13 | |||
| JP2006212773A | 2006-08-17 |
Attorney, Agent or Firm:
HIROSE KAZUHIKO (JP)
Kazuhiko Hirose (JP)
Kazuhiko Hirose (JP)
Download PDF:
Previous Patent: METHOD FOR PRODUCING FLUORINE-CONTAINING POLYETHER CARBOXYLIC ACID AMIDE
Next Patent: METAL ADSORBENT CONTAINING CHELATING POLYMER
Next Patent: METAL ADSORBENT CONTAINING CHELATING POLYMER