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Title:
METAL ALKOXIDE COMPOUND, THIN FILM-FORMING STARTING MATERIAL, METHOD FOR PRODUCING THIN FILM, AND ALCOHOL COMPOUND
Document Type and Number:
WIPO Patent Application WO/2014/077089
Kind Code:
A1
Abstract:
The present invention provides a metal alkoxide compound which has physical properties suitable for a starting material for forming a thin film by a CVD method, in particular, a metal alkoxide compound which has physical properties suitable for a starting material for forming a copper metal thin film. The present invention specifically provides a metal alkoxide compound which is represented by general formula (I) and a thin film-forming starting material which contains the metal alkoxide compound. (In the formula, R1 represents a methyl group or an ethyl group; R2 represents a hydrogen atom or a methyl group; R3 represents a linear or branched alkyl group having 1-3 carbon atoms; M represents a metal atom or a silicon atom; and n represents the valence of the metal atom or the silicon atom.)

Inventors:
SAKURAI, Atsushi (2-35 Higashiogu 7-chome, Arakawa-k, Tokyo 54, 〒1168554, JP)
HATASE, Masako (2-35 Higashiogu 7-chome, Arakawa-k, Tokyo 54, 〒1168554, JP)
YAMADA, Naoki (2-35 Higashiogu 7-chome, Arakawa-k, Tokyo 54, 〒1168554, JP)
SHIRATORI, Tsubasa (2-35 Higashiogu 7-chome, Arakawa-k, Tokyo 54, 〒1168554, JP)
SAITO, Akio (2-35 Higashiogu 7-chome, Arakawa-k, Tokyo 54, 〒1168554, JP)
YOSHINO, Tomoharu (2-35 Higashiogu 7-chome, Arakawa-k, Tokyo 54, 〒1168554, JP)
Application Number:
JP2013/078493
Publication Date:
May 22, 2014
Filing Date:
October 21, 2013
Export Citation:
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Assignee:
ADEKA CORPORATION (2-35, Higashiogu 7-chome Arakawa-k, Tokyo 54, 〒1168554, JP)
International Classes:
C07C251/08; C23C16/16; C23C16/40; H01L21/28; H01L21/285; C07F1/08; C07F15/04; C07F15/06
Domestic Patent References:
WO2005085175A12005-09-15
Foreign References:
JP2006328019A2006-12-07
US6982341B12006-01-03
JP2006143693A2006-06-08
JP2006249046A2006-09-21
JPS4961108A1974-06-13
JP2013216614A2013-10-24
JP2013032309A2013-02-14
US20080171890A12008-07-17
KR100675983B12007-01-23
JP2006328019A2006-12-07
Other References:
"COMPOUND 11", IZVESTIYA AKADEMII NAUK SSSR, SERIYA KHIMICHESKAYA, vol. 1, 1 January 1974 (1974-01-01), USSR, pages 206 - 208, XP008178836
"COMPOUND 8A", UKRAINSKII KHIMICHESKII ZHURNAL (RUSSIAN EDITION), vol. 47, no. 9, 1 January 1981 (1981-01-01), pages 959 - 961, XP008178834
See also references of EP 2921472A4
Attorney, Agent or Firm:
HATORI, Osamu (NIKKEN AKASAKA BLDG, 7F. 5-7, Akasaka 2-chome, Minato-K, Tokyo 52, 〒1070052, JP)
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