Title:
METAL FILM DEPOSITION
Document Type and Number:
WIPO Patent Application WO/2012/012026
Kind Code:
A3
Abstract:
Disclosed are modified Atomic Layer Deposition processes used to deposit metal films on a substrate.
Inventors:
DUSSARRAT CHRISTIAN (US)
OMARJEE VINCENT M (US)
OMARJEE VINCENT M (US)
Application Number:
PCT/US2011/038320
Publication Date:
March 08, 2012
Filing Date:
May 27, 2011
Export Citation:
Assignee:
AIR LIQUIDE (FR)
DUSSARRAT CHRISTIAN (US)
OMARJEE VINCENT M (US)
DUSSARRAT CHRISTIAN (US)
OMARJEE VINCENT M (US)
International Classes:
C23C16/448; H01L21/205
Foreign References:
| US20050011457A1 | 2005-01-20 | |||
| US20080274615A1 | 2008-11-06 | |||
| US20080199614A1 | 2008-08-21 |
Other References:
LI, H. E ET AL.: "Synthesis and Characterization of Ruthenium Amidinate Complexes as Precursors for Vapor Deposition", THE OPEN INORGANIC CHEMISTRY JOURNAL, vol. 2, no. 1, 2008, pages 11 - 17, XP002608222, DOI: doi:10.2174/1874098700802010011
Attorney, Agent or Firm:
MCQUEENEY, Patricia E. et al. (LLC2700 Post Oak Blvd.,Suite 180, Houston Texas, US)
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