Title:
METAL HARD MASK AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2016/047245
Kind Code:
A1
Abstract:
This metal hard mask (103) for etching an etching object film (102) that is present on an object to be processed is formed of an amorphous alloy film that is formed by a thin film formation technique. It is preferable to use a physical deposition method as the thin film formation technique, and sputtering is suitable for the use among physical deposition methods. This metal hard mask (103) is obtained by forming an amorphous alloy film on the etching object film (102) by a thin film formation technique and patterning the amorphous alloy film.
Inventors:
KIKUCHI YUUKI (JP)
NAGAI HIROYUKI (JP)
HIROTA YOSHIHIRO (JP)
SUZUKI MIKIO (JP)
NAGAI HIROYUKI (JP)
HIROTA YOSHIHIRO (JP)
SUZUKI MIKIO (JP)
Application Number:
PCT/JP2015/069900
Publication Date:
March 31, 2016
Filing Date:
July 10, 2015
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/3065; C23C14/14; H01L21/768
Foreign References:
| JP2005099605A | 2005-04-14 | |||
| JP2014078579A | 2014-05-01 | |||
| JP2005085821A | 2005-03-31 | |||
| JP2005317835A | 2005-11-10 |
Attorney, Agent or Firm:
TAKAYAMA HIROSHI (JP)
Hiroshi Takayama (JP)
Hiroshi Takayama (JP)
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