METAL MASK MATERIAL AND PRODUCTION METHOD THEREFOR

Title:

METAL MASK MATERIAL AND PRODUCTION METHOD THEREFOR

Document Type and Number:

WIPO Patent Application WO/2018/043641

Kind Code:

A1

Abstract:

Provided are: a metal mask material the shape change of which after etching is suppressed and which has more excellent etching properties; and a production method for the metal mask material. The metal mask material has a surface roughness in the rolling direction and a surface roughness in a direction perpendicular to the rolling direction, which satisfy 0.05 μm≤Ra≤0.25 μm and Rz≤1.5μm, and has a skewness Rsk of less than 0. When a sample having a length of 150 mm and a width of 30 mm is cut out of the metal mask material and the thickness of the sample is reduced by 60% by etching from one side of the sample, the amount of warpage of the sample is 15 mm or less. The metal mask material has a thickness of not less than 0.01 mm but less than 0.10 mm.

Inventors:

OMORI AKIHIRO (JP)
OKAMOTO TAKUYA (JP)
IIDA YASUYUKI (JP)

Application Number:

PCT/JP2017/031348

Publication Date:

March 08, 2018

Filing Date:

August 31, 2017

Export Citation:

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Assignee:

HITACHI METALS LTD (JP)

International Classes:

C22C38/00; C22C38/08; C21D9/46

Foreign References:

JP2016135505A	2016-07-28
JP2003183774A	2003-07-03
JP2001098347A	2001-04-10
JPH0474850A	1992-03-10
JP2002241901A	2002-08-28
JP2006097073A	2006-04-13
JP2010214447A	2010-09-30
JP2014101543A	2014-06-05

Other References: