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Title:
METAL MASK MATERIAL AND PRODUCTION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2018/043642
Kind Code:
A1
Abstract:
Provided are: a metal mask material the shape change of which after etching is suppressed and which is preferable in order to achieve good resist adhesiveness and good etching workability; and a production method for the metal mask material. The metal mask material has a surface roughness in the rolling direction and a surface roughness in a direction perpendicular to the rolling direction, which satisfy 0.05 μm≤Ra≤0.25 μm and Rz≤1.5 μm. The metal mask material has a skewness Rsk of 0 or greater in the direction perpendicular to the rolling direction. When a sample having a length of 150 mm and a width of 30 mm is cut out of the metal mask material and the thickness of the sample is reduced by 60% by etching from one side of the sample, the amount of warpage of the sample is 15 mm or less. The metal mask material has a thickness of 0.10-0.5 mm.

Inventors:
OMORI, Akihiro (HITACHI METALSLTD.,2107-2,Yasugi-cho,Yasugi-sh, Shimane 01, 〒6928601, JP)
OKAMOTO, Takuya (HITACHI METALSLTD.,2107-2,Yasugi-cho,Yasugi-sh, Shimane 01, 〒6928601, JP)
IIDA, Yasuyuki (HITACHI METALSLTD.,2107-2,Yasugi-cho,Yasugi-sh, Shimane 01, 〒6928601, JP)
Application Number:
JP2017/031349
Publication Date:
March 08, 2018
Filing Date:
August 31, 2017
Export Citation:
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Assignee:
HITACHI METALS,LTD. (2-70, Konan 1-chome Minato-k, Tokyo 24, 〒1088224, JP)
International Classes:
B21B1/22; B21B3/02; C21D9/46; C22C19/03; C22C38/00; C22C38/08; C22F1/00
Foreign References:
JP2010214447A2010-09-30
JP2002294407A2002-10-09
JPH09262603A1997-10-07
JPH07252602A1995-10-03
JPH04103743A1992-04-06
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