Title:
METAL MASK FOR SCAN DEPOSITION, DEPOSITION DEVICE, DEPOSITION METHOD, AND ELECTROLUMINESCENT DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/069066
Kind Code:
A1
Abstract:
Provided is a metal mask for scan deposition which is capable of forming a very fine linear deposition film pattern even on a large substrate. Two first unit aperture groups (2∙2a') are provided. The first unit aperture groups (2∙2a') are arranged offset from each other in the Y direction so as not to be next to each other in the X direction. Furthermore, the first unit aperture groups (2∙2a') which are next to each other in the Y direction are arranged offset from each other in the X direction by ½ of a first aperture pitch.
Inventors:
KOBAYASHI YUHKI
KIKUCHI KATSUHIRO
KAWATO SHINICHI
INOUE SATOSHI
NIBOSHI MANABU
KIKUCHI KATSUHIRO
KAWATO SHINICHI
INOUE SATOSHI
NIBOSHI MANABU
Application Number:
PCT/JP2016/080589
Publication Date:
April 27, 2017
Filing Date:
October 14, 2016
Export Citation:
Assignee:
SHARP KK (JP)
International Classes:
C23C14/24; C23C14/04; H01L51/50; H05B33/10
Domestic Patent References:
| WO2012124512A1 | 2012-09-20 | |||
| WO2011145456A1 | 2011-11-24 |
Foreign References:
| JP2008209902A | 2008-09-11 | |||
| JP2000188179A | 2000-07-04 | |||
| JPH08227276A | 1996-09-03 |
Attorney, Agent or Firm:
HARAKENZO WORLD PATENT & TRADEMARK (JP)
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