METAL THIN FILM PRODUCTION METHOD AND METAL THIN FILM

WIPO Patent Application WO/2010/095672

A1

Provided is a metal thin film formation method where using a metal particle dispersion, a conducting layer with a low volume resistivity is obtained on an insulated substrate. Said method includes a production step where a coating film including a metal particle dispersion is heat treated using superheated steam. Also provided is a metal thin film produced via said method. It is desirable that the coating film be formed from the metal particle dispersion being spread or printed onto the insulated substrate. The metal particle dispersion may contain a reducing agent, and the superheated steam may contain alcohol compounds.

YATSUKA TAKESHI (2-8 Dojimahama 2-Chome, Kita-Ku, Osaka-Sh, Osaka 30, 〒5308230, JP)
八塚　剛志 (〒30 大阪府大阪市北区堂島浜二丁目２番８号　東洋紡績株式会社　内 Osaka, 〒5308230, JP)
AYUZAWA YOSHITAKA (1-1 Katata 2-Chome, Ohtsu-Sh, Shiga 92, 〒5200292, JP)
鮎澤　佳孝 (〒92 滋賀県大津市堅田二丁目１番１号　東洋紡績株式会社　内 Shiga, 〒5200292, JP)

JP2010/052405

August 26, 2010

February 18, 2010

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TOYO BOSEKI KABUSHIKI KAISHA (2-8 Dojimahama 2-Chome, Kita-Ku Osaka-Sh, Osaka 30, 〒5308230, JP)
東洋紡績株式会社 (〒30 大阪府大阪市北区堂島浜二丁目２番８号 Osaka, 〒5308230, JP)
YATSUKA TAKESHI (2-8 Dojimahama 2-Chome, Kita-Ku, Osaka-Sh, Osaka 30, 〒5308230, JP)
八塚　剛志 (〒30 大阪府大阪市北区堂島浜二丁目２番８号　東洋紡績株式会社　内 Osaka, 〒5308230, JP)
AYUZAWA YOSHITAKA (1-1 Katata 2-Chome, Ohtsu-Sh, Shiga 92, 〒5200292, JP)

H01B13/00; B22F1/00; H01B5/14; H05K3/12

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